Removal of As(III) and As(V) in Contaminated Groundwater with Thin- Film Microporous Oxide Adsorbents

Home / Research / Removal of As(III) and As(V) in Contaminated Groundwater with Thin- Film Microporous Oxide Adsorbents
Project Number:

WR00R005

Funding Year:

2000

Contract Period:

7/1/2000 - 6/30/2002

Funding Source:

UWS, USGS

Investigator(s):
PIs:
  • Marc Anderson, UW-Madison
Abstract:

Objectives:
The principal objective of this study is to develop and test inexpensive, high-performance photoactive adsorption media for the simultaneous removal of arsenite, As(III), and arsenate, As(V), from groundwater without pH adjustment. This process utilizes UV-irradiated photoactive thin films composed of novel mixed oxides prepared by sol-gel processing. These materials will be employed in a unique photocatalytic process, which simultaneously removes both arsenic species without additional pH adjustment or further chemical addition.

Methods:
Aluminum oxide (Al2O3), spinel (MgAl2O4), and titanium oxide (TiO2) sols were synthesized by sol-gel technology and coated on glass beads. The adsorption efficiency of each coated material
was determined in a batch reactor.

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